Lab and Coral NameICL / semZeiss
ModelZeiss Supra 40
SpecialistPaul Tierney    (Kristofor Payer)
Physical Location2F 3-North Photo
Process CategoryMetrology
Material KeywordsNone
Sample Size6" Wafers, 4" Wafers, Pieces
AlternativeICL / AFM
Keywordssingle wafer, manual load, multiple pieces, top side of sample, vacuum, manual operation, alignment
The semZeiss is a low-V scanning electron microscope that can provide images with nanometer resolution. It uses a focused beam of electrons that interacts with the sample and leads to the generation of various signals that are then detected and processed to extract information about composition and topology. The system software enables measurement, annotation and analysis as well as saving of images in various formats.

Best forImaging nanometer features. Generating publication-quality images of samples.
LimitationsImaging photoresist and other insulating films can be challenging due to charging effects. Using the secondary electron gun can alleviate this issue, as well as using a low electron energy (~ 1.5 keV).
Characteristics/FOMIt has two detectors In-Lens (for the highest resolution) and Secondary Electrons. Magnification ranges from 12 to 900,000x. The stage is equipped with 5 motors: X(150 mm), Y(150 mm), Z(50 mm), Tilt(-3 to 70 deg) and Rotation (360 deg).
Caution withHitting the stage/sample when reducing the working distance, especially when imaging cross-sections or tilted images.
Machine Charges (academic rate)9pu/hour

Zeiss SEMSOP for the Zeiss SEM
Process Matrix Details

Been in the ALDSamples that have been in any of the ALD systems
Pyrex SubstratesPyrex substrates can be a concern due to high sodium content, which contaminates CMOS frontend tools
III-V SubstratesAny III-V substrates, e.g. GaAs, GaN, InP, and so on. Note though that many common III-V substrates will also carry the Au flag, but there are some GREEN III-V substrates.
Germanium on surfaceSamples with germanium on the surface (typically grown films)
Germanium buriedSamples with germanium buried below a different film
PiecesWafer pieces may not be handled by the equipment, and are harder to thoroughly clean - preventing them from running in certain tools.
Gold or RED color codeRED color code substrates. These are gold-contaminated or have been processed in gold contaminated tools. Gold and other metals can contaminate silicon devices (GREEN color code) and have to be separated.
Any exposure to CMOS metalIf the sample had ever seen a CMOS metal (or a tool that accepts CMOS metal), then some frontend tools could be contaminated by this.
CMOS metal on surfaceCMOS compatible metals exposed on the surface. These are Al,Ni,Pt,Ti,TiN. Other metals such as Au are *NOT* part of this.
CMOS metal buriedCMOS compatible metals covered entirely by a different material. These are Al,Ni,Pt,Ti,TiN. Other metals such as Au are *NOT* part of this.
Been in the STS DRIEThe DRIE etch leaves behind polymer residues on the sidewall ripples, which can be a contamination concern for some tools.
Been in the SEMA sample viewed in the SEM must have used the appropriate chuck to avoid cross-contamination
Been in the Concept1The Concep1 deposits dielectrics on GREEN wafers, however it also accepts metal and there can be cross-contamination for diffusion area
Has PhotoresistSamples with photoresist cannot be exposed to high temperatures, which is typical in deposition tools. Outgassing can be a concern.
Has PolyimidePolyimide is a very chemically resistant polymer, and can tolerate higher temperatures but cannot be exposed to typical PECVD deposition temperatures or diffusion furnaces. Outgassing can be a concern.
Has Cured SU8Not fully cured SU8 residues can heavily contaminated plasma chambers or destroy other user's samples, but fully cured SU8 is permitted in certain tools.
Coming from KOHAfter a KOH etch, the samples must receive a special clean because the K ions are highly contaminating to CMOS frontend tools
Coming from CMPAfter a CMP, the samples must receive a special clean, because the slurry residues otherwise introduce contamination and particles.

Not Allowed
Ever been in EMLSamples from EML are never permitted to return to ICL or TRL

For more details or help, please consult PTC matrix, email, or ask the research specialist (Paul Tierney)