Equipment
Lab and Coral NameEML / photo-hood-EML
Model0
SpecialistKurt Broderick    (Gary Riggott)
Physical Location5F 1-South Photo
Classification
Process CategoryWet
SubcategorySolvents
Material KeywordsPolyimide, SU8, Other Polymers, Photoresist, EBL Resist, Developer, Solvents
Sample Size6" Wafers, 4" Wafers, 7" Photo Plates, 5" Photo Plates, Pieces
Alternative?
Keywordssingle wafer, manual load, multiple pieces, both sides of sample, isotropic etch, manual operation
Description
The photo-hood-EML is a fume hood that solvent wet etch

Best for
Limitations
Characteristics/FOM
Caution with
Machine Charges (academic rate)8pu/run
Documents

SOP
Wet ProcessingRules and guidelines for wet processing

Documents
Etch rates part 2Berkeley etch rate paper
Process Matrix Details


PTC Matrix does not apply for EML
Ever been in EMLSamples from EML are never permitted to return to ICL or TRL