Equipment
Lab and Coral NameTRL / develop-Brewer
ModelBrewer CES
SpecialistDennis Ward     (Kristofor Payer)
Physical Location4F Photo-North
Classification
Process CategoryPhoto
SubcategoryCoat
Material KeywordsSilicon, III-V, GaN, Quartz, Pyrex, Photoresist, Developer
Sample Size6" Wafers, 4" Wafers, 7" Photo Plates, 5" Photo Plates
AlternativeTRL / photo-wet-l
Keywordssingle wafer, manual load, top side of sample, spinning substrate
Description
The develop-Brewer is a single wafer spin-develop system for puddle and spray developing of wafers. Both CD26 and AZ422 are available as developers. The system also has a built-in hotplate for postbaking [RED] wafers. The hotplate can also be used to cure polyimide under N2.

Best forStandard resist develop in TRL
LimitationsDeveloper tanks are small, and can be used up relatively fast. Check tank status on the scale in advance, and contact staff if refill is needed. Developing pieces is not permitted, and is best done in beakers. Hotplate for [RED] wafers only, and limited for postbakes only (no prebake).
Characteristics/FOMCD26, AZ422MIF
Caution withDon't open developer tanks unless trained, as tanks are pressurized. Brewer software often crashes when not in use.
Machine Charges (academic rate)2pu/wafer
Documents

SOP
DeveloperSOP for the Brewer developer and hotplate
Resist RecipesBaseline resist recipes for TRL

Documents
SPR700Datasheet for SPR700 standard resist
PhotoresistApplication Note describing photoresist chemistry
Liftoff ResistApplication Note describing liftoff resists
CoatingApplication Note describing spincoating
Developing ResistApplication Note describing resist development

External Links
GuideMicroChem Application Notes
Process Matrix Details

Permitted
Been in the ALDSamples that have been in any of the ALD systems
,
Pyrex SubstratesPyrex substrates can be a concern due to high sodium content, which contaminates CMOS frontend tools
,
III-V SubstratesAny III-V substrates, e.g. GaAs, GaN, InP, and so on. Note though that many common III-V substrates will also carry the Au flag, but there are some GREEN III-V substrates.
,
Germanium on surfaceSamples with germanium on the surface (typically grown films)
,
Germanium buriedSamples with germanium buried below a different film
,
PiecesWafer pieces may not be handled by the equipment, and are harder to thoroughly clean - preventing them from running in certain tools.
,
Gold or RED color codeRED color code substrates. These are gold-contaminated or have been processed in gold contaminated tools. Gold and other metals can contaminate silicon devices (GREEN color code) and have to be separated.
,
Any exposure to CMOS metalIf the sample had ever seen a CMOS metal (or a tool that accepts CMOS metal), then some frontend tools could be contaminated by this.
,
CMOS metal on surfaceCMOS compatible metals exposed on the surface. These are Al,Ni,Pt,Ti,TiN. Other metals such as Au are *NOT* part of this.
,
CMOS metal buriedCMOS compatible metals covered entirely by a different material. These are Al,Ni,Pt,Ti,TiN. Other metals such as Au are *NOT* part of this.
,
Been in the STS DRIEThe DRIE etch leaves behind polymer residues on the sidewall ripples, which can be a contamination concern for some tools.
,
Been in the SEMA sample viewed in the SEM must have used the appropriate chuck to avoid cross-contamination
,
Been in the Concept1The Concep1 deposits dielectrics on GREEN wafers, however it also accepts metal and there can be cross-contamination for diffusion area
,
Has PhotoresistSamples with photoresist cannot be exposed to high temperatures, which is typical in deposition tools. Outgassing can be a concern.
,
Has PolyimidePolyimide is a very chemically resistant polymer, and can tolerate higher temperatures but cannot be exposed to typical PECVD deposition temperatures or diffusion furnaces. Outgassing can be a concern.
,
Coming from KOHAfter a KOH etch, the samples must receive a special clean because the K ions are highly contaminating to CMOS frontend tools
,
Coming from CMPAfter a CMP, the samples must receive a special clean, because the slurry residues otherwise introduce contamination and particles.


Not Allowed
Ever been in EMLSamples from EML are never permitted to return to ICL or TRL
,
Has Cured SU8Not fully cured SU8 residues can heavily contaminated plasma chambers or destroy other user's samples, but fully cured SU8 is permitted in certain tools.


For more details or help, please consult PTC matrix, email ptc@mtl.mit.edu, or ask the research specialist (Dennis Ward )