Equipment
Lab and Coral NameICL / cv
ModelBoonton
SpecialistEric Lim    (Robert Bicchieri)
Physical Location2F 1-South Metrology
Classification
Process CategoryMetrology
SubcategoryElectrical
Material KeywordsCMOS Metals, Non-CMOS Metals
Sample Size6" Wafers
AlternativeTRL / IV-probe
Keywordssingle wafer, manual load, top side of sample, manual operation, alignment
Description
The cv is a Capacitance-Voltage meter connected to and open probe station with temperature-controlled chuck. The system is designed to perform temperature-bias stress in order to measure the level of mobile ion contamination in MOS gate dielectrics.

Best forSiO2 quality characterization
Limitationsonly one frequency (1MHz) available
Characteristics/FOMfrequency 1MHz, bias XX, Temperature up to 200C
Caution with
Machine Charges (academic rate)1pu/wafer
Documents
Process Matrix Details

Permitted


Not Allowed
Ever been in EMLSamples from EML are never permitted to return to ICL or TRL


For more details or help, please consult PTC matrix, email ptc@mtl.mit.edu, or ask the research specialist (Eric Lim)