Equipment
Lab and Coral NameEML / coater-EML
ModelSolitec
SpecialistKurt Broderick    (Gary Riggott)
Physical Location5F 1-South Photo
Classification
Process CategoryPhoto
SubcategoryCoat
Material KeywordsPolyimide, SU8, Other Polymers, Photoresist, EBL Resist
Sample Size6" Wafers, 4" Wafers, Pieces
Alternative?
Keywordssingle wafer, manual load, top side of sample, manual operation, spinning substrate
Description
This is a manual dispense spinner that can coat photoresists and other spinnable (spreadable) polymers (such as PMMA, BCB, SU8, SOG, etc)

Best forExperimental materials, coating wafer/pieces for EML processing
LimitationsSamples with backside topology (e.g. deep trenches) may not pull sufficient vaccum. Small pieces can be difficult to coat due to edge beads.
Characteristics/FOM
Caution with
Machine Charges (academic rate)2pu/wafer
Documents

SOP
Resist RecipesBaseline resist recipes for TRL

Documents
SPR700Datasheet for SPR700 standard resist
PhotoresistApplication Note describing photoresist chemistry
Liftoff ResistApplication Note describing liftoff resists
CoatingApplication Note describing spincoating
Developing ResistApplication Note describing resist development

External Links
GuideMicroChem Application Notes
Process Matrix Details


PTC Matrix does not apply for EML
Ever been in EMLSamples from EML are never permitted to return to ICL or TRL