New Process

Machines by Sample Size: 8

These wafers are really an exception at MTL, although some equipment is able to process them.
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ProcessLabToolKeywords0Description
Color Code
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EBL Elionix ERRORERROR Electron beam lithography system
Red &Green
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ICL wykoICL ERRORERROR Optical profiling system
Green
  +  
TRL Filmetrics-TRL ERRORERROR Thin film thickness measurement
Red &Green
  +  
TRL Heidelberg ERRORERROR Laser direct-write exposure for wafers and masks
Red &Green
  +  
TRL IV-probe ERRORERROR Probe station with curve tracer for IV measurement
Red
  +  
TRL DirectWrite-MLA150-OptAF ERRORERROR Direct-write lithography for wafers and larger pieces
Red &Green
  +  
TRL DirectWrite-MLA150-AirAF ERRORERROR Direct-write lithography for wafers and larger pieces
Red &Green
  +  
TRL photo-wet-Au ERRORERROR Solvent fume hood with sonicator
Red &Green
  +  
TRL photo-wet-l ERRORERROR Wetbench for photoresist development
Red &Green
  +  
TRL photo-wet-r ERRORERROR Wetbench for photoresist development
Red &Green
  +  
TRL SolventHood-TRL ERRORERROR Solvent fume hood
Red &Green
  +  
TRL varTemp ERRORERROR Bake oven for variable temperature
Red
  +  
TRL WYKO ERRORERROR Optical profiling system
Red &Green
  +  
NANO XRay-Inspection ERRORERROR X-Ray imaging
Red
  +  
NANO Microscope-QuickVision ERRORERROR Automated imaging microscope
Red
  +  
NANO PECVD-Samco-PD220 ERRORERROR Silicon dielectric PECVD deposition
Red &Green
  +  
NANO RIE-F-Samco-230iP ERRORERROR Fluorine based etcher for silicon dielectrics
Red &Green
  +  
NANO Coldplate-Solvent ERRORERROR Coldplate for PMMA developing
Red &Green
  +  
NANO Hotplate-Tower-U10 ERRORERROR Hotplate tower for pre- and post-baking, up to 300 mm
Red &Green
  +  
NANO Oven-PostBake-U10 ERRORERROR Oven for 120C postbake of photoresists
Red &Green
  +  
NANO Oven-PostBake-U12 ERRORERROR Oven for 120C postbake of photoresists
Red &Green
  +  
NANO Oven-PreBake-U10 ERRORERROR Oven for 97C prebake of photoresists
Red &Green
  +  
NANO Oven-PreBake-U12 ERRORERROR Oven for 97C prebake of photoresists
Red &Green
  +  
NANO Spinner-AllPurpose ERRORERROR All purpose spinner for user-supplied resist and small samples
Red &Green
  +  
NANO Spinner-EBL ERRORERROR Spinner for white-light compatible ebeam litho resists PMMA and HSQ
Red &Green
  +  
NANO Spinner-Resist ERRORERROR Wafer and large pieces spinner with three plumbed resists
Red &Green
  +  
NANO Develop-L08 ERRORERROR Fumehood for resist developing
Red &Green
  +  
NANO Develop-U10 ERRORERROR Fumehood for resist developing
Red &Green
  +  
NANO Develop-U12 ERRORERROR Fumehood for resist developing
Red &Green
  +  
NANO EBL-Spinner-Hood-U06 ERRORERROR Solvent fumehood for EBL coating and sample cleaning
Red &Green
  +  
NANO General-Spinner-Hood-U12 ERRORERROR Solvent fumehood for spin coating
Red &Green
  +  
NANO Liftoff-L08 ERRORERROR General purpose solvent hood and liftoff procedures
Red &Green
  +  
NANO Liftoff-L10 ERRORERROR General purpose solvent hood and liftoff procedures
Red &Green
  +  
NANO PhotoPrep-L10 ERRORERROR Solvent fumehood for general purpose lithography preparation
Red &Green
  +  
NANO Resist-Spinner-Hood-U10 ERRORERROR Solvent fumehood for spin coating
Red &Green
  +  
NANO Microscope-Inspect-4k ERRORERROR Inspection microscope with 4k camera, DIC, darkfield, up to 100x objectives
Red &Green
  +  
NANO Microscope-Inspect-HD ERRORERROR Inspection microscope with HD camera, up to 100x objectives
Red &Green
  +  
NANO Cleave-LatticeAx ERRORERROR Aligned sample cleaver for precision indenting and cleaving
Red &Green
  +  
NANO Scribe-Frontside ERRORERROR Sample frontside scribing tool
Red &Green
  +  
NANO Microscope-Stereo-Packaging ERRORERROR Stereoscope for packaging inspection and work
Red &Green
  +  
NANO Oven-PDMS ERRORERROR Oven for curing PDMS
Purple
  +  
NANO Spinner-SU8 ERRORERROR SU8 spin coater with plumbed developer/rinse/ebr
Purple
  +  
NANO SRD-L06 ERRORERROR Spin rinse drier for 4, 6, and 8 inch wafers
Red &Green
  +  
NANO SRD-U10 ERRORERROR Spin rinse drier for 4, 6, and 8 inch wafers
Red &Green
  +  
NANO Acid-Etch-General-U10 ERRORERROR Acid hood for general purpose acid work
Red &Green
  +  
NANO Acid-Extended-U07 ERRORERROR Acid hood for longer runs
Red &Green
  +  
NANO Acid-PostCMP-U07 ERRORERROR Acid hood for post-CMP sample cleaning
Red &Green
  +  
NANO Acid-PreClean-U06 ERRORERROR Acid bench for RCA and piranha cleaning of up to 6 inch wafers
Red &Green
  +  
NANO NitrideEtch-Phos-L06 ERRORERROR Acid bench for etching Si3N4 in hot phosphoric acid
Red &Green
  +  
NANO OxideEtch-HF-BOE-L06 ERRORERROR Acid bench for etching SiO2 in BOE and HF
Red &Green
  +  
NANO Piranha-L06 ERRORERROR Acid bench for piranha cleaning
Red &Green
  +  
NANO Piranha-U10 ERRORERROR Acid bench for piranha cleaning
Red &Green
  +  
NANO RCA-Diffusion-L02 ERRORERROR Acid bench for RCA cleaning before diffusion
Red &Green
  +  
NANO RCA-General-L06 ERRORERROR Acid bench for RCA cleaning
Red &Green
  +  
NANO SiliconEtch-KOH-L06 ERRORERROR Corrosive bench for Si etching with KOH
Red &Green
  +  
NANO Solvent-Clean-U06 ERRORERROR Solvent fumehood for sample cleaning including megasonic and CO2
Red &Green
  +  
NANO Solvent-L06 ERRORERROR Solvent hood for general purpose solvent work
Red &Green