New Process

Machines by Sample Size: 4

Older 100mm (or 4") wafers can be processed in many tools, sometimes with dedicated chucks. However, other tools are unable to accommodate these wafers, or may require special pucks or handle procesures.
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ProcessLabToolKeywords0Description
Color Code
  +  
EBL Elionix ERRORERROR Electron beam lithography system
Red &Green
  +  
EML acid-hood-EML ERRORERROR General Purpose Acid Fume-Hood
EML
  +  
NANO ALD-AllPurpose ERRORERROR Atomic Layer Deposition
Red
  +  
NANO Anneal-Tube ERRORERROR Anneal Furnace
Red
  +  
NANO Asher-SoftLitho ERRORERROR Oxygen Plasma
Red
  +  
NANO Anneal-Box ERRORERROR Anneal Furnace
Red
  +  
EML coater-EML ERRORERROR Photoresist Coater
EML
  +  
NANO Dektak-150 ERRORERROR Surface Profilerometer
Red
  +  
NANO EBeam-AJA ERRORERROR Metal and dielectric evaporator
Red
  +  
NANO Filmetrics-F20 ERRORERROR Thin Film Optical Measurement
Red &Green
  +  
NANO Ox-Tube-Lindberg ERRORERROR Oxidation Furnace
EML
  +  
EML parametric-tester ERRORERROR Probe station for electrical measurements
EML
  +  
EML photo-hood-EML ERRORERROR Solvent Fume hood for lithography
EML
  +  
EML plasmatherm ERRORERROR Plasma Etch and Deposition
EML
  +  
NANO RTA-900C ERRORERROR Rapid Thermal Annealing
Red
  +  
EML SolventHood-EML ERRORERROR Solvent Fume hood for lithography
EML
  +  
NANO Sputter-AJA-ChamberLoad ERRORERROR Sputter deposition tool
Red
  +  
NANO Vacuum-Oven ERRORERROR Temperature controlled vacuum oven
Red
  +  
TRL 2Dtransfer-platingHood ERRORERROR Electroplating wet bench and fume hood
Red
  +  
ICL 5A-GateOx ERRORERROR Diffusion tube for gate oxide growth
Green
  +  
ICL 5B-Anneal ERRORERROR Annealing tube
Green
  +  
ICL 5C-FieldOx ERRORERROR Diffusion tube for wet oxide growth of thicker films
Green
  +  
ICL 5D-ThickOx ERRORERROR Diffusion tube for wet oxide growth of thicker films
Green
  +  
ICL 6A-nPoly ERRORERROR Polysilicon deposition tube for n-type poly Si
Green
  +  
ICL 6B-Poly ERRORERROR Polysilicon deposition tube for p-type poly Si
Green
  +  
ICL 6C-LTO ERRORERROR Low temperature CVD oxide deposition
Green
  +  
ICL 6D-Nitride ERRORERROR Deposition of stoichiometric silicon nitride
Green
  +  
ICL AFM ERRORERROR Atomic Force Microscope for Surface Analysis
Red &Green
  +  
ICL ALD ERRORERROR Atomic Layer Deposition
Red
  +  
ICL ALD-Oxford ERRORERROR Atomic Layer Deposition
Green
  +  
ICL asher-ICL ERRORERROR Single wafer oxygen plasma for photoresist removal
Green
  +  
ICL diesaw ERRORERROR Wafer dicing saw
Red
  +  
NANO Diesaw-DAD3240 ERRORERROR Wafer dicing saw
Red
  +  
ICL eBeam-EVO ERRORERROR Metal evaporator of CMOS compatible metals
Green
  +  
NANO CMP-GnP ERRORERROR Chemical Mechanical Polishing to planarize surfaces
Red &Green
  +  
NANO Wirebond-Ball-MEI ERRORERROR Gold ball bonder for device packaging
Red
  +  
ICL i-stepper ERRORERROR i-line stepper
Red &Green
  +  
ICL nitrEtch-HotPhos ERRORERROR Hot phosphoric nitride etch bath
Green
  +  
ICL oxEtch-BOE ERRORERROR Silicon dioxide etch bath
Green
  +  
ICL Oxford-100_PECVD ERRORERROR Dual chamber PECVD and plasma etch tool
Red
  +  
ICL Oxford-100_Etch ERRORERROR Dual chamber PECVD and plasma etch tool
Red
  +  
ICL premetal-Piranha ERRORERROR Piranha resist removal and cleaning station
Green
  +  
ICL rca-ICL ERRORERROR Wafer cleaning before diffusion tubes
Green
  +  
ICL RTA2 ERRORERROR Rapid Thermal Annealing
Green
  +  
ICL RTA-pieces ERRORERROR Rapid Thermal Annealing
Red
  +  
ICL RTP ERRORERROR Rapid Thermal Annealing
Green
  +  
ICL RTP-Si ERRORERROR Rapid Thermal Annealing
Green
  +  
ICL semZeiss ERRORERROR Scanning Electron Microscope
Red &Green
  +  
ICL TMAH-KOHhood ERRORERROR Silicon bulk wet etching
Red &Green
  +  
ICL UV1280 ERRORERROR Thin film characterization
Green
  +  
ICL VTR ERRORERROR Low stress silicon nitride deposition
Green
  +  
ICL wykoICL ERRORERROR Optical profiling system
Green
  +  
TRL A1-GateOx ERRORERROR Thermal Oxidation for Green Silicon Wafers
Green
  +  
TRL A2-WetOxBond ERRORERROR Thermal Oxidation and other thermal process for GREEN Si wafers
Green
  +  
TRL A3-Sinter ERRORERROR Sintering for GREEN Si wafers
Green
  +  
TRL A4-III-Vanneal ERRORERROR Annealing for GREEN III-V samples
Red
  +  
TRL acid-hood ERRORERROR Acid processing station
Red &Green
  +  
TRL AJA-TRL ERRORERROR Sputter deposition tool
Red
  +  
TRL asher-TRL ERRORERROR Barrel asher for resist removal
Red &Green
  +  
TRL B1-Au ERRORERROR Gold compatible anneal tube
Red
  +  
TRL B2-Ox-alloy-Poly ERRORERROR Thermal Oxidation and LPCVD Polysilicon for RED wafers
Green
  +  
TRL B3-DryOx ERRORERROR Thermal Oxidation
Green
  +  
TRL B4-Poly ERRORERROR LPCVD polysilicon for Green wafers
Green
  +  
TRL CCNT ERRORERROR Carbon nanotube growth
Red
  +  
TRL coater ERRORERROR Manual spin-coater for photoresists
Red &Green
  +  
TRL dek-NoAu ERRORERROR Stylus Profilerometer
Green
  +  
TRL dektak-XT ERRORERROR Stylus Profilerometer
Red
  +  
TRL develop-Brewer ERRORERROR Resist develop and postbake
Red &Green
  +  
TRL eBeamAu ERRORERROR Metal evaporator
Red
  +  
TRL eBeamFP ERRORERROR Fast pumping metal evaporator
Red
  +  
TRL ellipsometer-TRL ERRORERROR Thin film thickness measurement
Red &Green
  +  
NANO MaskAlign-SoftLitho-EV620 ERRORERROR Contact mask aligner
Red &Green
  +  
TRL EV501 ERRORERROR Bonder system to apply heat, vacuum and pressure
Red &Green
  +  
TRL EV620 ERRORERROR Aligner for bonding
Red &Green
  +  
TRL EV-LC ERRORERROR Contact mask aligner
Red &Green
  +  
TRL Filmetrics-TRL ERRORERROR Thin film thickness measurement
Red &Green
  +  
TRL FLX ERRORERROR Thin film stress measurement
Red &Green
  +  
TRL Greenflo ERRORERROR Acid processing station
Red &Green
  +  
TRL Hall-probe ERRORERROR Carrier measurement
Red
  +  
TRL Heidelberg ERRORERROR Laser direct-write exposure for wafers and masks
Red &Green
  +  
TRL HMDS-TRL ERRORERROR HMDS oven
Red &Green
  +  
TRL hotplate1 ERRORERROR Hotplate for lithography
Red &Green
  +  
TRL hotplate2 ERRORERROR Hotplate for lithography
Red &Green
  +  
TRL hotplate300 ERRORERROR Hotplate for lithography
Red &Green
  +  
TRL IV-probe ERRORERROR Probe station with curve tracer for IV measurement
Red
  +  
NANO MaskAlign-MA6 ERRORERROR Contact mask aligner
Red &Green
  +  
TRL DirectWrite-MLA150-OptAF ERRORERROR Direct-write lithography for wafers and larger pieces
Red &Green
  +  
TRL DirectWrite-MLA150-AirAF ERRORERROR Direct-write lithography for wafers and larger pieces
Red &Green
  +  
TRL nanospec ERRORERROR Thin film thickness measurement
Red &Green
  +  
TRL OAI-Flood ERRORERROR Flood exposure for image reversal resists
Red &Green
  +  
TRL parylene ERRORERROR Parylene depopsition
Red
  +  
TRL photo-wet-Au ERRORERROR Solvent fume hood with sonicator
Red &Green
  +  
TRL photo-wet-l ERRORERROR Wetbench for photoresist development
Red &Green
  +  
TRL photo-wet-r ERRORERROR Wetbench for photoresist development
Red &Green
  +  
TRL plasmaquest ERRORERROR Fluorine and Chlorine general purpose plasma deposition and etch tool
Red
  +  
TRL PMMAspinner ERRORERROR Manual coater for PMMA and other photoresists
Red &Green
  +  
TRL postbake ERRORERROR Bake oven 120C
Red &Green
  +  
TRL prebakeovn ERRORERROR Bake oven 90C
Red &Green
  +  
TRL PZTcoater ERRORERROR Coater to apply PZT films
Red
  +  
TRL PZTfurnace ERRORERROR Bake oven for PZT coated wafers
Red
  +  
TRL rca-TRL ERRORERROR Wafer cleaning before diffusion tubes
Green
  +  
TRL Resonetics ERRORERROR Laser ablation system
Red
  +  
TRL RTA-HiT ERRORERROR Rapid Thermal Annealing
Red
  +  
TRL SAMCO ERRORERROR Chlorine based plasma etcher for III-V materials
Red
  +  
TRL SolventHood-TRL ERRORERROR Solvent fume hood
Red &Green
  +  
TRL sts-CVD ERRORERROR PECVD deposition of oxides, nitrides, a-Si, SiC, and P-doped a-Si
Red
  +  
TRL SU8spinner ERRORERROR Manual spin-coater for SU8 resists
Purple
  +  
TRL TBM-8 ERRORERROR Front-to-back alignement measurement
Red &Green
  +  
TRL UVozone-Au ERRORERROR Cleans residual organics
Red
  +  
TRL varTemp ERRORERROR Bake oven for variable temperature
Red
  +  
TRL WYKO ERRORERROR Optical profiling system
Red &Green
  +  
TRL XeF2 ERRORERROR XeF2 isotropic etching of silicon
Red
  +  
NANO XRay-Inspection ERRORERROR X-Ray imaging
Red
  +  
NANO Clean-Ar-Plasma ERRORERROR Plasma parts cleaning
Red
  +  
NANO Oven-Reflow ERRORERROR Reflow oven
Red
  +  
NANO Microscope-QuickVision ERRORERROR Automated imaging microscope
Red
  +  
NANO Interference-LloydsMirror ERRORERROR 0
Red &Green
  +  
NANO PECVD-Samco-PD220 ERRORERROR Silicon dielectric PECVD deposition
Red &Green
  +  
NANO RIE-F-Samco-230iP ERRORERROR Fluorine based etcher for silicon dielectrics
Red &Green
  +  
NANO Coldplate-Solvent ERRORERROR Coldplate for PMMA developing
Red &Green
  +  
NANO Hotplate-Tower-U10 ERRORERROR Hotplate tower for pre- and post-baking, up to 300 mm
Red &Green
  +  
NANO Hotplate-Tower-U12 ERRORERROR Hotplate tower for pre- and post-baking, up to 150 mm
Red &Green
  +  
NANO Oven-PostBake-U10 ERRORERROR Oven for 120C postbake of photoresists
Red &Green
  +  
NANO Oven-PostBake-U12 ERRORERROR Oven for 120C postbake of photoresists
Red &Green
  +  
NANO Oven-PreBake-U10 ERRORERROR Oven for 97C prebake of photoresists
Red &Green
  +  
NANO Oven-PreBake-U12 ERRORERROR Oven for 97C prebake of photoresists
Red &Green
  +  
NANO Spinner-AllPurpose ERRORERROR All purpose spinner for user-supplied resist and small samples
Red &Green
  +  
NANO Spinner-EBL ERRORERROR Spinner for white-light compatible ebeam litho resists PMMA and HSQ
Red &Green
  +  
NANO Spinner-Resist ERRORERROR Wafer and large pieces spinner with three plumbed resists
Red &Green
  +  
NANO Develop-L08 ERRORERROR Fumehood for resist developing
Red &Green
  +  
NANO Develop-U10 ERRORERROR Fumehood for resist developing
Red &Green
  +  
NANO Develop-U12 ERRORERROR Fumehood for resist developing
Red &Green
  +  
NANO EBL-Spinner-Hood-U06 ERRORERROR Solvent fumehood for EBL coating and sample cleaning
Red &Green
  +  
NANO General-Spinner-Hood-U12 ERRORERROR Solvent fumehood for spin coating
Red &Green
  +  
NANO Liftoff-L08 ERRORERROR General purpose solvent hood and liftoff procedures
Red &Green
  +  
NANO Liftoff-L10 ERRORERROR General purpose solvent hood and liftoff procedures
Red &Green
  +  
NANO PhotoPrep-L10 ERRORERROR Solvent fumehood for general purpose lithography preparation
Red &Green
  +  
NANO Resist-Spinner-Hood-U10 ERRORERROR Solvent fumehood for spin coating
Red &Green
  +  
NANO Microscope-Inspect-4k ERRORERROR Inspection microscope with 4k camera, DIC, darkfield, up to 100x objectives
Red &Green
  +  
NANO Microscope-Inspect-HD ERRORERROR Inspection microscope with HD camera, up to 100x objectives
Red &Green
  +  
NANO Cleave-LatticeAx ERRORERROR Aligned sample cleaver for precision indenting and cleaving
Red &Green
  +  
NANO Scribe-Backside ERRORERROR Sample backside scribing tool
Red &Green
  +  
NANO Scribe-Frontside ERRORERROR Sample frontside scribing tool
Red &Green
  +  
NANO Microscope-Stereo-Packaging ERRORERROR Stereoscope for packaging inspection and work
Red &Green
  +  
NANO Microscope-Stereo-SU8 ERRORERROR Stereoscope for placing/peeling/cutting of PDMS
Purple
  +  
NANO Oven-PDMS ERRORERROR Oven for curing PDMS
Purple
  +  
NANO SoftLitho-Develop ERRORERROR SU8 hood for baking
Purple
  +  
NANO SoftLitho-Prep ERRORERROR Fumehood for cleaning and preparing samples for SU8 and PDMS work
Purple
  +  
NANO Spinner-SU8 ERRORERROR SU8 spin coater with plumbed developer/rinse/ebr
Purple
  +  
NANO SU8-Spinner-Hood ERRORERROR Fumehood for SU8 spinning and solvent work
Purple
  +  
NANO SRD-L06 ERRORERROR Spin rinse drier for 4, 6, and 8 inch wafers
Red &Green
  +  
NANO SRD-U10 ERRORERROR Spin rinse drier for 4, 6, and 8 inch wafers
Red &Green
  +  
NANO Acid-Etch-General-U10 ERRORERROR Acid hood for general purpose acid work
Red &Green
  +  
NANO Acid-Extended-U07 ERRORERROR Acid hood for longer runs
Red &Green
  +  
NANO Acid-PostCMP-U07 ERRORERROR Acid hood for post-CMP sample cleaning
Red &Green
  +  
NANO Acid-PreClean-U06 ERRORERROR Acid bench for RCA and piranha cleaning of up to 6 inch wafers
Red &Green
  +  
NANO NitrideEtch-Phos-L06 ERRORERROR Acid bench for etching Si3N4 in hot phosphoric acid
Red &Green
  +  
NANO OxideEtch-HF-BOE-L06 ERRORERROR Acid bench for etching SiO2 in BOE and HF
Red &Green
  +  
NANO Piranha-L06 ERRORERROR Acid bench for piranha cleaning
Red &Green
  +  
NANO Piranha-U10 ERRORERROR Acid bench for piranha cleaning
Red &Green
  +  
NANO Plating-U04 ERRORERROR Electroplating wet bench and fume hood
Red &Green
  +  
NANO RCA-Diffusion-L02 ERRORERROR Acid bench for RCA cleaning before diffusion
Red &Green
  +  
NANO RCA-General-L06 ERRORERROR Acid bench for RCA cleaning
Red &Green
  +  
NANO SiliconEtch-KOH-L06 ERRORERROR Corrosive bench for Si etching with KOH
Red &Green
  +  
NANO Solvent-Clean-U06 ERRORERROR Solvent fumehood for sample cleaning including megasonic and CO2
Red &Green
  +  
NANO Solvent-L06 ERRORERROR Solvent hood for general purpose solvent work
Red &Green