New Process

Machines by Specialist: Scott Poesse


Scott Poesse
Research Specialist, 6.152J Technical Instructor
39-227 - (617)258-6117 - poesse@mtl.mit.edu
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ProcessLabToolProcess CategorySubcategoryDescription
Color Code
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TRL 2Dtransfer-platingHood WetAcids Electroplating wet bench and fume hood
Red
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NANO SRD-L06 WetClean Spin rinse drier for 4, 6, and 8 inch wafers
Red &Green
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NANO SRD-U10 WetClean Spin rinse drier for 4, 6, and 8 inch wafers
Red &Green
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NANO Acid-Etch-General-U10 WetEtch Acid hood for general purpose acid work
Red &Green
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NANO Acid-Extended-U07 WetEtch Acid hood for longer runs
Red &Green
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NANO Acid-PostCMP-U07 WetClean Acid hood for post-CMP sample cleaning
Red &Green
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NANO Acid-PreClean-U06 WetClean Acid bench for RCA and piranha cleaning of up to 6 inch wafers
Red &Green
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NANO NitrideEtch-Phos-L06 WetEtch Acid bench for etching Si3N4 in hot phosphoric acid
Red &Green
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NANO OxideEtch-HF-BOE-L06 WetEtch Acid bench for etching SiO2 in BOE and HF
Red &Green
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NANO Piranha-L06 WetClean Acid bench for piranha cleaning
Red &Green
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NANO Piranha-U10 WetClean Acid bench for piranha cleaning
Red &Green
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NANO Plating-U04 WetTBD Electroplating wet bench and fume hood
Red &Green
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NANO RCA-Diffusion-L02 WetClean Acid bench for RCA cleaning before diffusion
Red &Green
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NANO RCA-General-L06 WetClean Acid bench for RCA cleaning
Red &Green
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NANO SiliconEtch-KOH-L06 WetEtch Corrosive bench for Si etching with KOH
Red &Green