New Process

Machines by Specialist: Paul Tierney


Paul Tierney
Research Specialist, Photolithography
39-229 - (617)253-5245 - tierney@mtl.mit.edu
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ProcessLabToolProcess CategorySubcategoryDescription
Color Code
  +  
ICL asher-ICL PhotoClean Single wafer oxygen plasma for photoresist removal
Green
  +  
ICL pTrack PhotoCoat Automated coater and developer track
Green
  +  
ICL i-stepper PhotoExpose i-line stepper
Red &Green
  +  
ICL nitrEtch-HotPhos WetAcids Hot phosphoric nitride etch bath
Green
  +  
ICL oxEtch-BOE WetAcids Silicon dioxide etch bath
Green
  +  
ICL premetal-Piranha WetAcids Piranha resist removal and cleaning station
Green
  +  
ICL semZeiss MetrologySEM Scanning Electron Microscope
Red &Green
  +  
NANO Coldplate-Solvent LithoDevelop Coldplate for PMMA developing
Red &Green
  +  
NANO Spinner-EBL LithoCoat Spinner for white-light compatible ebeam litho resists PMMA and HSQ
Red &Green
  +  
NANO EBL-Spinner-Hood-U06 LithoCoat Solvent fumehood for EBL coating and sample cleaning
Red &Green