New Process

Machines by Specialist: Robert Bicchieri


Robert Bicchieri
Research Specialist, Vacuum Etching
39-215 - (617)253-6418 - bic@mtl.mit.edu
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ProcessLabToolProcess CategorySubcategoryDescription
Color Code
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ICL LAM490B EtchRIE Chlorine based plasma etching of silicon
Green
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ICL LAM590-ICL EtchRIE Fluorine based plasma etching of silicon oxide and nitrides
Green
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ICL Oxford-100_PECVD Deposition, EtchPECVD Dual chamber PECVD and plasma etch tool
Red
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ICL Oxford-100_Etch Deposition, EtchRIE Dual chamber PECVD and plasma etch tool
Red
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ICL VTR DiffusionCVD Low stress silicon nitride deposition
Green
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TRL CCNT DepositionPECVD Carbon nanotube growth
Red
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TRL LAM590-TRL EtchRIE Fluorine based plasma etching of oxide and nitrides
Red
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TRL plasmaquest EtchRIE Fluorine and Chlorine general purpose plasma deposition and etch tool
Red
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TRL XeF2 EtchRIE XeF2 isotropic etching of silicon
Red