New Process

Machines by Subcategory: RIE

Plasma based (dry) etching of materials, typically less than 1 um
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ProcessLabToolProcess CategorySubcategoryDescription
Color Code
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EML plasmatherm Deposition, EtchPECVD, RIE Plasma Etch and Deposition
EML
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ICL AME5000 EtchRIE RIE etcher for frontend silicon processes
Green
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ICL LAM490B EtchRIE Chlorine based plasma etching of silicon
Green
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ICL LAM590-ICL EtchRIE Fluorine based plasma etching of silicon oxide and nitrides
Green
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ICL Oxford-100_Etch Deposition, EtchRIE Dual chamber PECVD and plasma etch tool
Red
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ICL rainbow EtchRIE Chlorine based plasma etcher for metals
Green
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TRL LAM590-TRL EtchRIE Fluorine based plasma etching of oxide and nitrides
Red
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TRL plasmaquest EtchRIE Fluorine and Chlorine general purpose plasma deposition and etch tool
Red
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TRL SAMCO EtchRIE Chlorine based plasma etcher for III-V materials
Red
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TRL XeF2 EtchRIE XeF2 isotropic etching of silicon
Red
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NANO RIE-F-Samco-230iP EtchRIE Fluorine based etcher for silicon dielectrics
Red &Green