New Process

Machines by Subcategory: Expose

UV exposure of photoresist through mask
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ProcessLabToolProcess CategorySubcategoryDescription
Color Code
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EBL Elionix PhotoExpose Electron beam lithography system
Red &Green
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ICL i-stepper PhotoExpose i-line stepper
Red &Green
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NANO MaskAlign-SoftLitho-EV620 Photo, SoftLithoExpose, SU8 Contact mask aligner
Red &Green
  +  
TRL EV-LC PhotoExpose Contact mask aligner
Red &Green
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TRL Heidelberg PhotoExpose Laser direct-write exposure for wafers and masks
Red &Green
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NANO MaskAlign-MA6 PhotoExpose Contact mask aligner
Red &Green
  +  
TRL DirectWrite-MLA150-OptAF PhotoExpose Direct-write lithography for wafers and larger pieces
Red &Green
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TRL DirectWrite-MLA150-AirAF PhotoExpose Direct-write lithography for wafers and larger pieces
Red &Green
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TRL OAI-Flood PhotoExpose Flood exposure for image reversal resists
Red &Green
  +  
TRL Resonetics PhotoExpose Laser ablation system
Red
  +  
NANO Interference-LloydsMirror LithoExpose 0
Red &Green