New Process

Machines by Subcategory: Clean

Removes residue and contaminants, can involve acids, solvents, or plasma
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ProcessLabToolProcess CategorySubcategoryDescription
Color Code
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NANO Asher-SoftLitho Photo, SoftLithoClean, PDMS Oxygen Plasma
Red
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ICL asher-ICL PhotoClean Single wafer oxygen plasma for photoresist removal
Green
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ICL rca-ICL DiffusionClean Wafer cleaning before diffusion tubes
Green
MTL Procedures-Cleaning ProceduresClean Sample Cleaning
Red &Green
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TRL asherMatrix-TRL PhotoClean Single wafer oxygen plasma for photoresist removal
Red
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TRL asher-TRL PhotoClean Barrel asher for resist removal
Red &Green
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TRL rca-TRL DiffusionClean Wafer cleaning before diffusion tubes
Green
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TRL UVozone-Au EtchClean Cleans residual organics
Red
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NANO Clean-Ar-Plasma PackagingClean, LEAP Plasma parts cleaning
Red
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NANO Liftoff-L08 LithoClean General purpose solvent hood and liftoff procedures
Red &Green
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NANO Liftoff-L10 LithoClean General purpose solvent hood and liftoff procedures
Red &Green
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NANO SRD-L06 WetClean Spin rinse drier for 4, 6, and 8 inch wafers
Red &Green
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NANO SRD-U10 WetClean Spin rinse drier for 4, 6, and 8 inch wafers
Red &Green
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NANO Acid-PostCMP-U07 WetClean Acid hood for post-CMP sample cleaning
Red &Green
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NANO Acid-PreClean-U06 WetClean Acid bench for RCA and piranha cleaning of up to 6 inch wafers
Red &Green
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NANO Piranha-L06 WetClean Acid bench for piranha cleaning
Red &Green
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NANO Piranha-U10 WetClean Acid bench for piranha cleaning
Red &Green
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NANO RCA-Diffusion-L02 WetClean Acid bench for RCA cleaning before diffusion
Red &Green
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NANO RCA-General-L06 WetClean Acid bench for RCA cleaning
Red &Green
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NANO Solvent-Clean-U06 WetClean Solvent fumehood for sample cleaning including megasonic and CO2
Red &Green
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NANO Solvent-L06 WetClean Solvent hood for general purpose solvent work
Red &Green
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NANO Ops-ParticleCounter WetClean Particle Counter for staff use
Red &Green
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NANO Computers WetClean Desktop computers in the lab
Red &Green