New Process

Machines by Material Keyword: Photoresist

Standard organic photoresists, stocked by MTL. Non-stock resists require PTC approval and must be used only with the approved process.
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ProcessLabToolProcess CategorySubcategoryDescription
Color Code
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EML acid-hood-EML WetSolvents General Purpose Acid Fume-Hood
EML
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NANO Asher-SoftLitho Photo, SoftLithoClean, PDMS Oxygen Plasma
Red
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EML coater-EML PhotoCoat Photoresist Coater
EML
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NANO EBeam-AJA DepositionEvaporate Metal and dielectric evaporator
Red
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NANO Filmetrics-F20 MetrologyThickness Thin Film Optical Measurement
Red &Green
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EML photo-hood-EML WetSolvents Solvent Fume hood for lithography
EML
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EML SolventHood-EML WetSolvents Solvent Fume hood for lithography
EML
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ICL asher-ICL PhotoClean Single wafer oxygen plasma for photoresist removal
Green
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ICL pTrack PhotoCoat Automated coater and developer track
Green
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ICL eBeam-EVO DepositionEvaporate Metal evaporator of CMOS compatible metals
Green
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ICL i-stepper PhotoExpose i-line stepper
Red &Green
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ICL premetal-Piranha WetAcids Piranha resist removal and cleaning station
Green
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ICL UV1280 MetrologyThickness Thin film characterization
Green
MTL Procedures-Cleaning ProceduresClean Sample Cleaning
Red &Green
MTL Procedures-General ProceduresGeneral Broader concepts
Red &Green
MTL Procedures-Lithography ProceduresPhoto Lithography
Red &Green
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TRL acid-hood WetAcids Acid processing station
Red &Green
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TRL asherMatrix-TRL PhotoClean Single wafer oxygen plasma for photoresist removal
Red
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TRL asher-TRL PhotoClean Barrel asher for resist removal
Red &Green
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TRL coater PhotoCoat Manual spin-coater for photoresists
Red &Green
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TRL develop-Brewer PhotoCoat Resist develop and postbake
Red &Green
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TRL eBeamAu DepositionEvaporate Metal evaporator
Red
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TRL eBeamFP DepositionEvaporate Fast pumping metal evaporator
Red
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TRL ellipsometer-TRL MetrologyThickness Thin film thickness measurement
Red &Green
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NANO MaskAlign-SoftLitho-EV620 Photo, SoftLithoExpose, SU8 Contact mask aligner
Red &Green
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TRL EV-LC PhotoExpose Contact mask aligner
Red &Green
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TRL Filmetrics-TRL MetrologyThickness Thin film thickness measurement
Red &Green
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TRL Greenflo WetAcids Acid processing station
Red &Green
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TRL Heidelberg PhotoExpose Laser direct-write exposure for wafers and masks
Red &Green
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TRL hotplate1 PhotoBake Hotplate for lithography
Red &Green
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TRL hotplate2 PhotoBake Hotplate for lithography
Red &Green
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TRL hotplate300 PhotoBake Hotplate for lithography
Red &Green
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NANO MaskAlign-MA6 PhotoExpose Contact mask aligner
Red &Green
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TRL DirectWrite-MLA150-OptAF PhotoExpose Direct-write lithography for wafers and larger pieces
Red &Green
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TRL DirectWrite-MLA150-AirAF PhotoExpose Direct-write lithography for wafers and larger pieces
Red &Green
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TRL nanospec MetrologyThickness Thin film thickness measurement
Red &Green
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TRL OAI-Flood PhotoExpose Flood exposure for image reversal resists
Red &Green
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TRL photo-wet-Au WetSolvents Solvent fume hood with sonicator
Red &Green
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TRL photo-wet-l WetSolvents Wetbench for photoresist development
Red &Green
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TRL photo-wet-r WetSolvents Wetbench for photoresist development
Red &Green
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TRL PMMAspinner PhotoCoat Manual coater for PMMA and other photoresists
Red &Green
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TRL postbake PhotoBake Bake oven 120C
Red &Green
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TRL prebakeovn PhotoBake Bake oven 90C
Red &Green
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TRL Resonetics PhotoExpose Laser ablation system
Red
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TRL SolventHood-TRL WetSolvents Solvent fume hood
Red &Green
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TRL varTemp PhotoBake Bake oven for variable temperature
Red