New Process

Machines by General Keyword: multi wafer

The tool can process many wafers (usually by loading a cassette) without the user's need to attend to each wafer.
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ProcessLabToolProcess CategorySubcategoryDescription
Color Code
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NANO Anneal-Tube DiffusionBake Anneal Furnace
Red
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NANO Anneal-Box DiffusionBake Anneal Furnace
Red
  +  
NANO Ox-Tube-Lindberg DiffusionOxidation Oxidation Furnace
EML
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ICL 5A-GateOx DiffusionOxidation Diffusion tube for gate oxide growth
Green
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ICL 5B-Anneal DiffusionBake Annealing tube
Green
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ICL 5C-FieldOx DiffusionOxidation Diffusion tube for wet oxide growth of thicker films
Green
  +  
ICL 5D-ThickOx DiffusionOxidation Diffusion tube for wet oxide growth of thicker films
Green
  +  
ICL 6A-nPoly DiffusionCVD Polysilicon deposition tube for n-type poly Si
Green
  +  
ICL 6B-Poly DiffusionCVD Polysilicon deposition tube for p-type poly Si
Green
  +  
ICL 6C-LTO DiffusionCVD Low temperature CVD oxide deposition
Green
  +  
ICL 6D-Nitride DiffusionCVD Deposition of stoichiometric silicon nitride
Green
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ICL AME5000 EtchRIE RIE etcher for frontend silicon processes
Green
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ICL asher-ICL PhotoClean Single wafer oxygen plasma for photoresist removal
Green
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ICL pTrack PhotoCoat Automated coater and developer track
Green
  +  
ICL concept1 DepositionPECVD PECVD deposition of oxides, nitrides, and TEOS
Green
  +  
ICL DCVD DepositionPECVD PECVD deposition of oxides, nitrides, and a-Si
Green
  +  
ICL eBeam-EVO DepositionEvaporate Metal evaporator of CMOS compatible metals
Green
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ICL endura DepositionSputter Metal sputter deposition
Green
  +  
ICL epi-Centura DepositionCVD Not open to public
Green
  +  
ICL i-stepper PhotoExpose i-line stepper
Red &Green
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ICL LAM490B EtchRIE Chlorine based plasma etching of silicon
Green
  +  
ICL LAM590-ICL EtchRIE Fluorine based plasma etching of silicon oxide and nitrides
Green
  +  
ICL nitrEtch-HotPhos WetAcids Hot phosphoric nitride etch bath
Green
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ICL oxEtch-BOE WetAcids Silicon dioxide etch bath
Green
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ICL premetal-Piranha WetAcids Piranha resist removal and cleaning station
Green
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ICL rainbow EtchRIE Chlorine based plasma etcher for metals
Green
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ICL rca-ICL DiffusionClean Wafer cleaning before diffusion tubes
Green
  +  
ICL RTP DiffusionBake Rapid Thermal Annealing
Green
  +  
ICL RTP-Si DiffusionBake Rapid Thermal Annealing
Green
  +  
ICL TMAH-KOHhood WetAcids Silicon bulk wet etching
Red &Green
  +  
ICL UV1280 MetrologyThickness Thin film characterization
Green
  +  
ICL VTR DiffusionCVD Low stress silicon nitride deposition
Green
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TRL A1-GateOx DiffusionOxidation Thermal Oxidation for Green Silicon Wafers
Green
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TRL A2-WetOxBond DiffusionOxidation Thermal Oxidation and other thermal process for GREEN Si wafers
Green
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TRL A3-Sinter DiffusionBake Sintering for GREEN Si wafers
Green
  +  
TRL A4-III-Vanneal DiffusionBake Annealing for GREEN III-V samples
Red
  +  
TRL acid-hood WetAcids Acid processing station
Red &Green
  +  
TRL asherMatrix-TRL PhotoClean Single wafer oxygen plasma for photoresist removal
Red
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TRL asher-TRL PhotoClean Barrel asher for resist removal
Red &Green
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TRL B1-Au DiffusionOxidation Gold compatible anneal tube
Red
  +  
TRL B2-Ox-alloy-Poly DiffusionOxidation Thermal Oxidation and LPCVD Polysilicon for RED wafers
Green
  +  
TRL B3-DryOx DiffusionOxidation Thermal Oxidation
Green
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TRL B4-Poly DiffusionCVD LPCVD polysilicon for Green wafers
Green
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TRL eBeamAu DepositionEvaporate Metal evaporator
Red
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TRL eBeamFP DepositionEvaporate Fast pumping metal evaporator
Red
  +  
TRL Greenflo WetAcids Acid processing station
Red &Green
  +  
TRL HMDS-TRL PhotoBake HMDS oven
Red &Green
  +  
TRL LAM590-TRL EtchRIE Fluorine based plasma etching of oxide and nitrides
Red
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TRL postbake PhotoBake Bake oven 120C
Red &Green
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TRL prebakeovn PhotoBake Bake oven 90C
Red &Green
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TRL rca-TRL DiffusionClean Wafer cleaning before diffusion tubes
Green
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TRL sts-Pegasus EtchDRIE Deep reactive ion etcher for silicon
Red
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TRL varTemp PhotoBake Bake oven for variable temperature
Red