New Process

Machines by General Keyword: isotropic etch

Etching is primarily isotropic (etches uniformly in all directions)
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ProcessLabToolProcess CategorySubcategoryDescription
Color Code
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EML acid-hood-EML WetSolvents General Purpose Acid Fume-Hood
EML
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NANO Asher-SoftLitho Photo, SoftLithoClean, PDMS Oxygen Plasma
Red
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EML photo-hood-EML WetSolvents Solvent Fume hood for lithography
EML
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EML plasmatherm Deposition, EtchPECVD, RIE Plasma Etch and Deposition
EML
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EML SolventHood-EML WetSolvents Solvent Fume hood for lithography
EML
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ICL asher-ICL PhotoClean Single wafer oxygen plasma for photoresist removal
Green
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ICL nitrEtch-HotPhos WetAcids Hot phosphoric nitride etch bath
Green
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ICL oxEtch-BOE WetAcids Silicon dioxide etch bath
Green
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ICL premetal-Piranha WetAcids Piranha resist removal and cleaning station
Green
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ICL rca-ICL DiffusionClean Wafer cleaning before diffusion tubes
Green
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ICL TMAH-KOHhood WetAcids Silicon bulk wet etching
Red &Green
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TRL acid-hood WetAcids Acid processing station
Red &Green
  +  
TRL asherMatrix-TRL PhotoClean Single wafer oxygen plasma for photoresist removal
Red
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TRL asher-TRL PhotoClean Barrel asher for resist removal
Red &Green
  +  
TRL Greenflo WetAcids Acid processing station
Red &Green
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TRL photo-wet-Au WetSolvents Solvent fume hood with sonicator
Red &Green
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TRL photo-wet-l WetSolvents Wetbench for photoresist development
Red &Green
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TRL photo-wet-r WetSolvents Wetbench for photoresist development
Red &Green
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TRL PZTfurnace DepositionBake Bake oven for PZT coated wafers
Red
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TRL rca-TRL DiffusionClean Wafer cleaning before diffusion tubes
Green
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TRL Resonetics PhotoExpose Laser ablation system
Red
  +  
TRL SolventHood-TRL WetSolvents Solvent fume hood
Red &Green
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TRL UVozone-Au EtchClean Cleans residual organics
Red
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TRL XeF2 EtchRIE XeF2 isotropic etching of silicon
Red