New Process

Machines by Process Category: Wet

Wet processing covers either the use of solvents and photoresist developers, or the use of corrosive chemicals for sample cleaning or etching of materials. Each wet station has a very dedicated purpose. Acid- and solvent work is physically separated, and must not be mixed (dangerous). The range of tools in TRL, however, can be confusing at first: some tools are equivalent (e.g. acid-hood and Greenflo), while others are physically in the same location but used for slightly different purposes (photo-wet-l for developing, and photo-wet-r for solvent work).

The proper choice of beaker types is very important (e.g. most acids use glass beakers, but HF requires plastic). Safety procedures for both acid and solvent work is important. Solvents have a special waste stream. Acid hoods have aspirators. Many helpful and important details are found in the safety sections of the SOP, and it is vital to follow these - to protect yourself and other users.

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ProcessLabToolSubcategoryDescription
Color Code
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EML acid-hood-EML Solvents General Purpose Acid Fume-Hood
EML
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EML photo-hood-EML Solvents Solvent Fume hood for lithography
EML
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EML SolventHood-EML Solvents Solvent Fume hood for lithography
EML
  +  
TRL 2Dtransfer-platingHood Acids Electroplating wet bench and fume hood
Red
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NANO CMP-GnP Other Chemical Mechanical Polishing to planarize surfaces
Red &Green
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ICL nitrEtch-HotPhos Acids Hot phosphoric nitride etch bath
Green
  +  
ICL oxEtch-BOE Acids Silicon dioxide etch bath
Green
  +  
ICL premetal-Piranha Acids Piranha resist removal and cleaning station
Green
  +  
ICL TMAH-KOHhood Acids Silicon bulk wet etching
Red &Green
  +  
TRL acid-hood Acids Acid processing station
Red &Green
  +  
TRL Greenflo Acids Acid processing station
Red &Green
  +  
TRL photo-wet-Au Solvents Solvent fume hood with sonicator
Red &Green
  +  
TRL photo-wet-l Solvents Wetbench for photoresist development
Red &Green
  +  
TRL photo-wet-r Solvents Wetbench for photoresist development
Red &Green
  +  
TRL SolventHood-TRL Solvents Solvent fume hood
Red &Green
  +  
NANO SRD-L06 Clean Spin rinse drier for 4, 6, and 8 inch wafers
Red &Green
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NANO SRD-U10 Clean Spin rinse drier for 4, 6, and 8 inch wafers
Red &Green
  +  
NANO Acid-Etch-General-U10 Etch Acid hood for general purpose acid work
Red &Green
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NANO Acid-Extended-U07 Etch Acid hood for longer runs
Red &Green
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NANO Acid-PostCMP-U07 Clean Acid hood for post-CMP sample cleaning
Red &Green
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NANO Acid-PreClean-U06 Clean Acid bench for RCA and piranha cleaning of up to 6 inch wafers
Red &Green
  +  
NANO NitrideEtch-Phos-L06 Etch Acid bench for etching Si3N4 in hot phosphoric acid
Red &Green
  +  
NANO OxideEtch-HF-BOE-L06 Etch Acid bench for etching SiO2 in BOE and HF
Red &Green
  +  
NANO Piranha-L06 Clean Acid bench for piranha cleaning
Red &Green
  +  
NANO Piranha-U10 Clean Acid bench for piranha cleaning
Red &Green
  +  
NANO Plating-U04 TBD Electroplating wet bench and fume hood
Red &Green
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NANO RCA-Diffusion-L02 Clean Acid bench for RCA cleaning before diffusion
Red &Green
  +  
NANO RCA-General-L06 Clean Acid bench for RCA cleaning
Red &Green
  +  
NANO SiliconEtch-KOH-L06 Etch Corrosive bench for Si etching with KOH
Red &Green
  +  
NANO Solvent-Clean-U06 Clean Solvent fumehood for sample cleaning including megasonic and CO2
Red &Green
  +  
NANO Solvent-L06 Clean Solvent hood for general purpose solvent work
Red &Green
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NANO Ops-ParticleCounter Clean Particle Counter for staff use
Red &Green
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NANO Computers Clean Desktop computers in the lab
Red &Green